Rohm and Haas to invest US$60 million in 193nm immersion lithography system

Press release, June 27; Rodney Chan, DIGITIMES Asia Wednesday 27 June 2007 0

Rohm and Haas Electronic Materials will invest US$60 million in leading-edge lithography equipment to support its extensive research and development of advanced 193nm photoresist and anti-reflective coatings used in the manufacture of semiconductor...

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