CONNECT WITH US

Applied Materials introduces 45nm photomask etch technology with new Tetra III system

Press release, April 17; Esther Lam, DIGITIMES Asia 0

Applied Materials launched its new Applied Centura Tetra III Advanced Reticle Etch, the system that delivers the nanomanufacturing technology required for etching 45nm photomasks.

The article requires paid subscription. Subscribe Now