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Toshiba breaks ground for Phase 2 of Fab 5

Jessie Shen, DIGITIMES, Taipei Friday 23 August 2013 0

Toshiba on August 23 held a groundbreaking ceremony in readiness for the start of construction of Phase 2 of Fab 5, a NAND flash fab located at the company's Yokkaichi operations memory production facility in Mie Prefecture, Japan.

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