Home Tech Semiconductors

Sumitomo schedules photoresist production for 32nm EUV lithography by 2008

Vyacheslav Sobolev, DigiTimes.com, Taipei Friday 16 September 2005 0

At the recently concluded SEMICON Taiwan, Japan-based Sumitomo Chemical revealed a roadmap for its Sumiresist materials used in semiconductor photolithography to form a patterned coating on the surface of a substrate. According to the roadmap, the company...

The article requires paid subscription. Subscribe Now

Email address

Password

Save my User ID and Password

Save my User ID and Password

Some subscribers prefer to save their log-in information so they do not have to enter their User ID and Password each time they visit the site. To activate this function, check the 'Save my User ID and Password' box in the log-in section. This will save the password on the computer you're using to access the site.

Note: If you choose to use the log-out feature, you will lose your saved information. This means you will be required to log-in the next time you visit our site.

NEW individual users please REGISTER first.

Enterprise user first-time LOGIN.

I forgot my ID and/or password?

MEMBERSHIP BENEFITS

Full access to articles dating back to 2000.
Real-time access to the news as it breaks.
Access to premium content.
Full access to Tomorrow's Headlines.
Asia Supply Chain 250 dataset access.