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PSMC closer to 0.13-micron photomask production

Carol C.Y. Hsu, Hsinchu; Noah Sauve, DIGITIMES Asia Thursday 12 April 2001 0

Precision Semiconductor Mask Corporation (PSMC) recently installed Toshiba’s EBM-3500 vector scanning electron beam lithography system for the production of 0.13-micron photomasks. It is preparing to conduct a pilot run in the next few weeks,...

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