KLA-Tencor announces new inspection portfolio for 3X/2Xnm nodes

Press release; Jessie Shen, DIGITIMES Asia Tuesday 14 July 2009 0

KLA-Tencor has announced two new wafer inspection systems and a new electron-beam (e-beam) review system to address defect issues at the 3Xnm / 2Xnm nodes. Each new tool can preferentially detect and report yield-relevant defects, enabling fabs to more...

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