When production goes beyond sub 22nm, ASML to go with EUV while TSMC will choose e-beam

Claire Sung, Taipei; Esther Lam, DIGITIMES Asia Tuesday 25 July 2006 0

While highlighting its recent launched lithography system that approaches the limit of water-based immersion technology, ASML indicated that it anticipates that industry players will adopt extreme ultraviolet (EUV) technology when shrinking the production...

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