TSMC likely to choose e-beam for next generation lithography tools

Claire Sung, Taipei; Esther Lam, DIGITIMES Asia Wednesday 4 April 2007 0

In terms of overall cost structure and performance benefits, Taiwan Semiconductor Manufacturing Company (TSMC) will likely adopt electron-beam (e-beam) direct write as its prominent next-generation lithography tools, according to Burn Lin, senior director...

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