ASML pushes EUV for sub 22nm lithography

Claire Sun and Esther Lam, DigiTimes.com Tuesday 12 September 2006 0

ASML has reiterated its positive outlook for extreme ultraviolet (EUV) as the mainstream lithography light source when going to deep submicron production while its closely-tied pure-play foundry partner Taiwan Semiconductor Manufacturing Company (TSMC)...

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