CONNECT WITH US

Intel completes high-NA EUV validation for 14A, advances 2D transistor tech

Chia-Han Lee, Taipei; Charlene Chen, DIGITIMES Asia 0

Credit: Intel

Intel has completed acceptance testing of the industry's first commercial high-NA EUV lithography system with a numerical aperture of 0.55, the ASML Twinscan EXE:5200B, laying the foundation for mass production of its 14A process node. This milestone...

The article requires paid subscription. Subscribe Now