REALTIME NEWS

Applied Materials clears critical roadblock to EUV lithography with new photomask etch system

Press release

Sep 20, 2011, 11:49 0

Applied Materials, Inc. advanced the state-of-the art in photomask technology with its new Applied Centura Tetra EUV Advanced Reticle Etch system. Overcoming a major hurdle to the adoption of EUV (extreme ultraviolet) lithography, the new Tetra EUV system...

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