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China's homegrown DUV equipment struggles with multiple exposures, hindering chip process advancements

Amanda Liang, Taipei; Willis Ke, DIGITIMES Asia 0

Credit: HiSilicon Technologies

China's latest domestically produced DUV exposure machine cannot perform the critical multiple exposures needed for advanced chip production, making it incapable of achieving finer process nodes like 28nm and below. This limitation hampers China's efforts...

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