News tagged High-NA at DIGITIMES

NEWS TAGGED HIGH-NA

Tuesday 15 September 2026

Samsung, SK Hynix diverge on cell design for sub-10nm DRAM in 2028

Samsung Electronics and SK Hynix are preparing to move DRAM below the 10nm threshold in 2028, with the two memory makers pursuing different...

Friday 11 September 2026

Samsung, SK Hynix eye 2028 High-NA DRAM rollout

SK Hynix is targeting 2028 to apply High-NA extreme ultraviolet lithography to DRAM mass production and is considering joining an industry...

Thursday 10 September 2026

Analysis: China chases EUV as chipmakers move to High-NA

The extreme ultraviolet (EUV) lithography race is splitting into two tracks. Intel has moved High-NA EUV into production, Samsung Electronics and SK Hynix are targeting DRAM production...

Wednesday 9 September 2026

Huawei orchestrates China's DUV lithography push to cut reliance on ASML

Huawei is emerging as a central organiser of China's effort to build a domestic semiconductor equipment supply chain, backing critical lithography suppliers and helping connect them...

Friday 21 August 2026

Samsung holds off on High-NA EUV until 1nm production

Samsung Electronics does not expect to move High-NA EUV lithography into volume production until its 1nm-class generation, a timeline that points to around 2030, after it had earlier...

Thursday 13 August 2026

Samsung delays High-NA EUV adoption until 1nm production in 2030

Samsung Electronics plans to introduce high-numerical-aperture extreme ultraviolet (High-NA EUV) lithography into mass production at its 1nm node around 2030, according to South Korean...

Thursday 13 August 2026

SK Hynix expands EUV roadmap with High-NA tools and PSM adoption

SK hynix said it is advancing its use of extreme ultraviolet (EUV) lithography for the mass production of next-generation DRAM, with high-numerical-aperture (High-NA) EUV equipment...

Thursday 23 July 2026

Intel 18A adopts High-NA EUV in dual-certification push

Intel Foundry has moved high numerical aperture (High-NA) EUV lithography into production on its Intel 18A process, with ASML confirming in a recent press release that Intel is using...

Tuesday 21 July 2026

Samsung keeps High-NA EUV rollout cautious as foundry profitability remains the focus

Samsung Electronics is taking a slower approach than Intel to High-NA extreme ultraviolet (EUV) lithography for advanced chip production,...

Sunday 19 July 2026

ASML supplier Trumpf says South Korea EUV demand is growing faster than Taiwan's

High-NA EUV lithography is becoming the semiconductor equipment industry's next major battleground as demand rises for more advanced chips used in artificial intelligence, high-performance...

Wednesday 20 May 2026

ASML to deliver first High-NA chips within months despite cost concerns

ASML expects its first advanced semiconductors made using next-generation High-Numerical Aperture (High-NA) extreme ultraviolet (EUV) lithography equipment to ship within months.

Sunday 26 April 2026

ASML cuts management layers due to restructuring; TSMC stance affects High-NA outlook

ASML is moving to eliminate a wide range of management roles as part of a broader effort to simplify its organization and improve execution,...

Thursday 17 July 2025

ASML ships first High-NA EUV tool; Intel takes lead as TSMC, Samsung hold back

ASML posted stronger-than-expected second-quarter 2025 earnings and projected a 15% jump in revenue for 2025 while maintaining a robust gross margin forecast of around 52%. However,...

Friday 27 June 2025

ASML bets on High-NA EUV as Intel, TSMC, Samsung delay mass adoption over cost and risk

ASML, the world's sole provider of extreme ultraviolet (EUV) lithography machines, is pressing ahead with its next-generation High-NA (numerical aperture) EUV systems—even as...

Tuesday 17 June 2025

ASML's next act: High-NA, Hyper-NA and the edge of what's possible

ASML Holding NV, the Dutch semiconductor equipment leader, dominates extreme ultraviolet (EUV) lithography, key to producing cutting-edge semiconductor chips. As the industry pushes...

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