IMEC has announced that it has signed a new agreement with ASML for a period of five years (2011-2015). The pair's continued collaboration guarantees the global semiconductor ecosystem...
Applied Materials, Inc. advanced the state-of-the art in photomask technology with its new Applied Centura Tetra EUV Advanced Reticle Etch system. Overcoming a major hurdle to the...
Cymer expects its business to double by 2015 from 2010 thanks to development of the company's emerging products. Specializing in excimer laser illumination sources for deep ultraviolet...
After a plunge to 16% of the semiconductor equipment market in 2009, the lithography sector surged in 2010 to a 26.5% share of the global market, according to The Information Netwo...
ASML has recently invited DRAM companies to make early reservations for extreme ultraviolet (EUV) lithography tools to avoid a repeat of early 2010, when immersion scanners saw constrained...
A bottom-up analysis of product portfolio, business performance, and technology and manufacturing trends of 25 IC vendors confirms the explosive growth of LED driver ICs, according...
Macronix International has announced an equipment purchase worth 76.44 million euro (US$100.72 million) from ASML, which supplies lithography systems, via a company filing with the...
Chassis maker Ju Teng International Holdings is ready to introduce nano imprint lithography (NIL) technology to its production lines, but monthly capacity of the new production technology...
Taiwan Semiconductor Manufacturing Company (TSMC) will take delivery of its first extreme ultraviolet (EUV) lithography system from ASML in 2011 paving the way for the company to...
Lithography equipment supplier ASML has rehired 700 employees that were previously laid off, as well as recruiting several hundreds of new staff, to meet a big surge in demand for...
ASML Holding today announced that Taiwan Semiconductor Manufacturing Company (TSMC) will take delivery of a Twinscan NXE:3100 extreme ultra-violet (EUV) lithography system. This tool...
Growing delivery lead times for immersion scanner equipment is likely to interrupt Nanya Technology and Inotera Memories' planned technology transition to sub-50nm in 2010, according...
Toshiba has announced development of a high-resolution photo-sensitive film (photoresist) essential for future application of extreme ultraviolet (EUV) lithography in semiconductor...
After engaging in a massive capital spending program during the middle of the decade, the worldwide DRAM industry now has sufficient manufacturing capacity to last through 2012, causing...
