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NEWS TAGGED LITHOGRAPHY
Monday 12 October 2009
ASML upbeat on micro-lithography growth
Customers have turned more active in placing orders, according to Antonio Mesquida Kusters, Director of Market Intelligence for ASML. Citing predictions by research firms, Kusters...
Wednesday 15 July 2009
Elpida reportedly developing die-shrink 50nm process without expenditure on new tools
Elpida Memory has been quietly developing a technology based on its existing 65nm equipment for DRAM production, to enable a die shrink to 50nm, industry sources have claimed. The...
Tuesday 14 July 2009
Cymer ships laser-produced plasma EUV lithography source to ASML
Cymer, which specializes in excimer laser illumination sources for deep ultraviolet (DUV) photolithography systems, has kicked off shipments of what it claims is the world's first...
Monday 6 July 2009
TSMC joins CEA-Leti program on multiple e-beam lithography
Taiwan Semiconductor Manufacturing Company (TSMC) has announced it will join a three-year program led by the CEA-Leti research institute on electron-beam (e-beam) maskless lithography...
Monday 18 May 2009
TSMC sees delay in e-beam equipment delivery
Taiwan Semiconductor Manufacturing Company (TSMC) has seen a delay in the delivery of 300mm multiple electron-beam (e-beam) maskless lithography equipment from Mapper Lithography...
Monday 23 March 2009
Hermes Microvision lands e-beam equipment order from SMIC
Semiconductor Manufacturing International Corporation (SMIC) has placed orders for three e-beam inspection systems for 45nm and below production with Hermes Microvision (HMI), a subsidiary...
Monday 23 March 2009
Semiconductor lithography sector continues to outperform rest of market, says The Information Network
High-priced equipment enabled the semiconductor lithography sector to grow to 25% of entire front-end equipment processing market in 2008, according to market research firm The Information...
Tuesday 30 December 2008
Foundries freeze procurement of new lithography tools for 2009, says paper
As foundries will likely suffer a utilization rate of less than 40% in the first quarter of 2009, orders for new lithography tools are currently limited, according to a Chinese-language...
Thursday 25 December 2008
ASML to start shipping EUV systems for sub 22nm node by 2010
Shipments of semiconductor equipment supplier ASM Lithography's (ASML's) extreme ultraviolet (EUV) systems for 22nm and sub-22nm process nodes are expected to kick off by 2010, according...
Monday 1 December 2008
Applied Materials introduces aerial imaging to boost lithography productivity
Applied Materials has announced its Applied Aera2 for lithography system. Using the system's IntenCD technology in the fab, semiconductor manufacturers can improve wafer critical...
Wednesday 5 November 2008
TSMC to install multiple-beam lithography system in 2009
Taiwan Semiconductor Manufacturing Company (TSMC) is expected to install its first multiple-electron-beam direct write (MEBDW) lithography system for the development of 20nm and more...
Thursday 16 October 2008
SemiLEDs orders multiple lithography systems for LED manufacturing
Ultratec, a supplier of lithography and laser-processing systems used to manufacture semiconductor devices, recently announced it received a multiple-system order from US-based SemiLEDs,...
Tuesday 14 October 2008
Mapper and TSMC sign agreement for multiple e-beam lithography for 22nm node
Mapper Lithography and Taiwan Semiconductor Manufacturing Company (TSMC) have signed an agreement, according to which Mapper will ship its first 300mm multiple-electron-beam maskless...
Thursday 18 September 2008
IBM looks at mathematical techniques to help overcome lithography obstacles at 22nm
In response to ever increasing demands for smaller, more powerful and energy-efficient devices for cloud computing and high-performance servers, IBM has announced the semiconductor...