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NEWS TAGGED LITHOGRAPHY
Monday 1 December 2008
Applied Materials introduces aerial imaging to boost lithography productivity
Applied Materials has announced its Applied Aera2 for lithography system. Using the system's IntenCD technology in the fab, semiconductor manufacturers can improve wafer critical...
Wednesday 5 November 2008
TSMC to install multiple-beam lithography system in 2009
Taiwan Semiconductor Manufacturing Company (TSMC) is expected to install its first multiple-electron-beam direct write (MEBDW) lithography system for the development of 20nm and more...
Thursday 16 October 2008
SemiLEDs orders multiple lithography systems for LED manufacturing
Ultratec, a supplier of lithography and laser-processing systems used to manufacture semiconductor devices, recently announced it received a multiple-system order from US-based SemiLEDs,...
Tuesday 14 October 2008
Mapper and TSMC sign agreement for multiple e-beam lithography for 22nm node
Mapper Lithography and Taiwan Semiconductor Manufacturing Company (TSMC) have signed an agreement, according to which Mapper will ship its first 300mm multiple-electron-beam maskless...
Thursday 18 September 2008
IBM looks at mathematical techniques to help overcome lithography obstacles at 22nm
In response to ever increasing demands for smaller, more powerful and energy-efficient devices for cloud computing and high-performance servers, IBM has announced the semiconductor...